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1

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Computer modeling of charging-induced electron beam deflection in electron beam lithography

Hwu, Justin J., Ko, Yeong-Uk, Joy, David C., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 493 KB

english, 2000

2

Monte Carlo simulation of charging effects on linewidth metrology

Yeong-Uk Ko, Myung-Sae Chung, Seung-Woo Kim

Journal:

Year:

1998

Language:

english

File:

PDF, 331 KB

english, 1998

3

Monte carlo simulation of charging effects in linewidth metrology (II): On insulator substrate

Yeong-Uk Ko, Myung-Sae Chung

Journal:

Year:

1998

Language:

english

File:

PDF, 1.81 MB

english, 1998

4

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Monte Carlo model of charging in resists in e-beam lithography

Ko, Yeong-Uk, Hwu, Justin J., Joy, David C., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 666 KB

english, 2000

5

[IEEE 2014 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2014.5.19-2014.5.21)] 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) - New interferometric measurement technique for small diameter TSV

Timoney, Padraig, Fisher, Daniel, Yeong-Uk Ko,, Vaid, Alok, Thangaraju, Sarasvathi, Smith, Daniel, Kamineni, Himani, Dingyou Zhang,, Alapati, Ramakanth, Wonwoo Kim,, Ke Xiao,, Edmundson, Holly, Sm

Year:

2014

Language:

english

File:

PDF, 435 KB

english, 2014

6

[IEEE 2014 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2014.5.19-2014.5.21)] 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) - Correlation study of white light interferometer measurements with atomic force microscope measurements for post-CMP dishing measurements applied to TSV processing

Fisher, Daniel W., Timoney, Padraig, Yeong-Uk Ko,, Vaid, Alok, Thangaraju, Sarasvathi, Smith, Daniel, Sung Pyo Jung,, Alapati, Ramakanth, Wonwoo Kim,, Peak, Jonathan, Amin, Hemant, Johnson, Tim

Year:

2014

Language:

english

File:

PDF, 322 KB

english, 2014

7

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Secondary-electron image profiles using bias voltage technique in deep contact hole

Ko, Yeong-Uk, Joy, David C., Sullivan, Neal T., Mastovich, Martin E., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 424 KB

english, 2001

8

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Precision improvement in diffraction measurement for the one-dimensional grating period

O, Beomhoan, Song, Won Young, Park, Byong Chon, Ko, Yeong-Uk, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 345 KB

english, 1999

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Metrology of white light interferometer for TSV processing

Cain, Jason P., Sanchez, Martha I., Timoney, Padraig, Ko, Yeong-Uk, Fisher, Daniel, Lu, Cheng Kuan, Ramnath, Yudesh, Vaid, Alok, Thangaraju, Sarasvathi, Smith, Daniel, Kamineni, Himani, Zhang, Dingyou

Year:

2014

Language:

english

File:

PDF, 546 KB

english, 2014

10

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Metrics of resolution and performance for CD-SEMs

Joy, David C., Ko, Yeong-Uk, Hwu, Justin J., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 2.79 MB

english, 2000

11

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Monte Carlo simulation of charging effects on linewidth metrology

Ko, Yeong-Uk, Jones, Susan K.

Year:

1997

Language:

english

File:

PDF, 705 KB

english, 1997

12

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Simulation of imaging in projection microscope using multibeam probe

Ko, Yeong-Uk, Joy, David C., Herr, Daniel J. C.

Year:

2002

Language:

english

File:

PDF, 254 KB

english, 2002

13

SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Integrated Circuit Metrology, Inspection, and Process Control VI - Scanning electron microscope system for linewidth measurement of IC

Eom, Cheon I., Eom, TaeBong, Ko, Yeong-Uk, Chung, Myung-Sai, Postek, Jr., Michael T.

Year:

1992

Language:

english

File:

PDF, 400 KB

english, 1992

14

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Modeling of substrate current measurement and charge transfer in insulators

Ko, Yeong-Uk, Archie, Chas N., Yamada, Keizo, Ushiki, Takeo, Newcomb, Robert

Year:

2006

Language:

english

File:

PDF, 419 KB

english, 2006

15

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Linewidth measurement of wafers using SEM and its uncertainty evaluation

Ko, Yeong-Uk, Eom, TaeBong, Kim, Ki-Hong, Kim, Seung-Woo, Jones, Susan K.

Year:

1996

Language:

english

File:

PDF, 348 KB

english, 1996

16

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Precision improvement for the calibration of submicron dimension reference for electron-beam metrology system

O, Beomhoan, Park, Byong Chon, Ko, Yeong-Uk, Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 330 KB

english, 1998

17

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Influence of various factors on charging effects in linewidth metrology

Ko, Yeong-Uk, Singh, Bhanwar

Year:

1998

Language:

english

File:

PDF, 1.12 MB

english, 1998

18

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Developing an understanding of electron beam imaging of deep contact hole structures using Monte Carlo and spatial charge distribution simulations

Sullivan, Neal, Silver, Richard M., Lee, Byoung H., Ko, Yeong-Uk

Year:

2005

Language:

english

File:

PDF, 700 KB

english, 2005

19

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - CD measurement in flash memory using substrate current technology

Ko, Yeong-Uk, Archie, Chas N., Yamada, Keizo, Ushiki, Takeo

Year:

2007

Language:

english

File:

PDF, 419 KB

english, 2007

20

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Monte Carlo simulation of charging effects in linewidth metrology: II. On insulator substrate

Ko, Yeong-Uk, Chung, Myung-Sai, Singh, Bhanwar

Year:

1999

Language:

english

File:

PDF, 1.01 MB

english, 1999

21

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Simulation of repairing thin-film phase defect in masks for EUV lithography

Ko, Yeong-Uk, Joy, David C., Hector, Scott D., Lu, Bing, Herr, Daniel J.

Year:

2003

Language:

english

File:

PDF, 1.09 MB

english, 2003

22

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Monte Carlo model of charging in resists in e-beam lithography

Ko, Yeong-Uk, Joy, David C., Sullivan, Neal T.

Year:

2001

Language:

english

File:

PDF, 186 KB

english, 2001

23

SPIE Proceedings [SPIE SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation - San Diego, CA (Sunday 11 July 1993)] Interferometry VI: Techniques and Analysis - Holographic fringe interpretation by FFT and carrier-fringe method

Ko, Yeong-Uk, Kang, Chu-Shik, Chung, Myung-Sai, Kwon, Young H., Kwon, Osuk Y., Brown, Gordon M., Kujawinska, Malgorzata

Year:

1993

Language:

english

File:

PDF, 277 KB

english, 1993

24

[AIP The 2000 international conference on characterization and metrology for ULSI technology - Gaithersburg, Maryland (USA) (26-29 June 2000)] AIP Conference Proceedings - Secondary electron image profiles using bias voltage technique in deep contact hole

Year:

2001

Language:

english

File:

PDF, 817 KB

english, 2001